Poly(n-alkylsilsesquioxane)s : synthesis, characterization, and modification with poly(dimethylsiloxane)

Luís A. S. A. De Prado; Iris L. Torriani; Inez V. P. Yoshida

Poly(n-alkylsilsesquioxane)s : synthesis, characterization, and modification with poly(dimethylsiloxane)

Luís A. S. A. De Prado, Iris L. Torriani, Inez V. P. Yoshida

Material

ARTIGO

Idioma

Inglês

Nota geral

Agradecimentos: The authors thank FAPESP (Proc. No 03/09,962-1) and CNPq (Proc. No 305916/2006-8) for financial support. The authors acknowledge C. H. Collins for manuscript revision. Tomas Pivelic is acknowledged for the experimental support given to the small-angle X-ray scattering measurements

Resumo Abstract: Self-supported translucent films constituted of poly(n-octylsilsesquioxane) or poly(n-dodecylsilsesquioxane) were obtained from the hydrolysis and condensation of n-octyltriethoxysilane (OTES) or n-dodecyltriethoxysi lane (DTES), respectively. Dense films were obtained in the absence of... Ver mais Abstract: Self-supported translucent films constituted of poly(n-octylsilsesquioxane) or poly(n-dodecylsilsesquioxane) were obtained from the hydrolysis and condensation of n-octyltriethoxysilane (OTES) or n-dodecyltriethoxysi lane (DTES), respectively. Dense films were obtained in the absence of organic solvents, with dibutyltin diacetate as catalyst. These films exhibited good optical transparency and thermal stability. The incorporation of oligomeric dimethylsiloxane units (D-Me,D-Me) in these materials, derived from silanol-terminated poly(dimethylsiloxane) (PDMS) or 1,1,3,3-tetramethyl-1,3-diethoxydisiloxane (TMDES), was carried out during the hydrolysis and condensation of OTES and DTES and was confirmed by solid-state Si-29 NMR. Poly(n-octylsilsesquioxane) showed a glass-transition temperature at -65 degrees C, due to the increase in the free volume, promoted by the bulky n-octyl groups. The differential scanning calorimetric (DSC) curves of the polymer derived from DTES were characterized by first-order transitions at temperatures ranging from -15.8 to -0.7 degrees C. Further studies of these networks by low-temperature XRD evidenced narrowing of the diffraction halos suggesting a partial order-disorder transition for these materials at lower temperatures. Good thermal stability up to 350 degrees C and the solvent-free production process make these polymers potential candidates for the development of self-supported hydrophobic protective coatings Ver menos

Nota de informação sobre financiamento

FUNDAÇÃO DE AMPARO À PESQUISA DO ESTADO DE SÃO PAULO - FAPESP

03/09,962-1

CONSELHO NACIONAL DE DESENVOLVIMENTO CIENTÍFICO E TECNOLÓGICO - CNPQ

305916/2006-8

Direito de acesso

Fechado

Assuntos

Policondensação

Polissiloxanos

Raios X - Espalhamento a baixo ângulo

Artigo original

Autoria

Prado, Luís Antonio Sanchez de Almeida, 1971- Autor

Torriani, Iris Concepcion Linares de, 1934- Autor

Yoshida, Inez Valéria Pagotto, 1950- Autor

Sites

DOI: https://doi.org/10.1002/pola.23885

Texto completo: https://onlinelibrary.wiley.com/doi/10.1002/pola.23885

Poly(n-alkylsilsesquioxane)s : synthesis, characterization, and modification with poly(dimethylsiloxane)

Luís A. S. A. De Prado, Iris L. Torriani, Inez V. P. Yoshida

Poly(n-alkylsilsesquioxane)s : synthesis, characterization, and modification with poly(dimethylsiloxane)

Luís A. S. A. De Prado, Iris L. Torriani, Inez V. P. Yoshida

Fontes

Journal of polymer science. Part A, polymer chemistry Vol. 48, n. 5 (Mar., 2010), p. 1220-1229

Terminal de consulta web

Poly(n-alkylsilsesquioxane)s : synthesis, characterization, and modification with poly(dimethylsiloxane)

Poly(n-alkylsilsesquioxane)s : synthesis, characterization, and modification with poly(dimethylsiloxane)

Poly(n-alkylsilsesquioxane)s : synthesis, characterization, and modification with poly(dimethylsiloxane)

Fontes