Electron beam irradiation for the formation of thick Ag film on Ag3PO4
João Paulo de Campos da Costa, Marcelo Assis, Vinícius Teodoro, Andre Rodrigues, Camila Cristina de Foggi, Miguel Angel San-Miguel, João Paulo Pereira do Carmo, Juan Andrés, Elson Longo
ARTIGO
Inglês
Agradecimentos: The authors acknowledge the financial support from Universitat Jaume I by the project UJIB2016-25, Generalitat Valenciana (PrometeoII/2014/022, ACOMP/2014/270, and ACOMP/2015/1202), Ministerio de Economía y Competitividad, Spain (project CTQ2015-65207-P); FAPESP (2019/18656-6,...
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Agradecimentos: The authors acknowledge the financial support from Universitat Jaume I by the project UJIB2016-25, Generalitat Valenciana (PrometeoII/2014/022, ACOMP/2014/270, and ACOMP/2015/1202), Ministerio de Economía y Competitividad, Spain (project CTQ2015-65207-P); FAPESP (2019/18656-6, 2013/07296-2, 2016/23891-6), CNPq, and CAPES. The authors also thank the computational resources of the Centro Nacional de Processamento de Alto Desempenho em São Paulo (CENAPAD-SP), Centro de Computação John David Rogers (CCJDR-UNICAMP), and CENAPAD-RJ (SDumont).
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Abstract: This study demonstrates that the electron beam irradiation of materials, typically used in characterization measurements, could be employed for advanced fabrication, modification, and functionalization of composites. We developed irradiation equipment using an electron beam irradiation...
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Abstract: This study demonstrates that the electron beam irradiation of materials, typically used in characterization measurements, could be employed for advanced fabrication, modification, and functionalization of composites. We developed irradiation equipment using an electron beam irradiation source to be applied in materials modification. Using this equipment, the formation of a thick Ag film on the Ag3PO4 semiconductor is carried out by electron beam irradiation for the first time. This is confirmed by various experimental techniques (X-ray diffraction, field-emission scanning electron microscopy, Raman spectroscopy, and X-ray photoelectron spectroscopy) and ab initio molecular dynamics simulations. Our calculations demonstrate that, at the earlier stages, metallic Ag growth is initiated preferentially at the (110) surface, with the reduction of surface Ag cations forming metallic Ag clusters. As the (100) and (111) surfaces have smaller numbers of exposed Ag cations, the reductions on these surfaces are slower and are accompanied by the formation of O2 molecules
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COORDENAÇÃO DE APERFEIÇOAMENTO DE PESSOAL DE NÍVEL SUPERIOR - CAPES
CONSELHO NACIONAL DE DESENVOLVIMENTO CIENTÍFICO E TECNOLÓGICO - CNPQ
FUNDAÇÃO DE AMPARO À PESQUISA DO ESTADO DE SÃO PAULO - FAPESP
2013/07296-2; 2016/23891-6; 2019/18656-6
Aberto
Electron beam irradiation for the formation of thick Ag film on Ag3PO4
João Paulo de Campos da Costa, Marcelo Assis, Vinícius Teodoro, Andre Rodrigues, Camila Cristina de Foggi, Miguel Angel San-Miguel, João Paulo Pereira do Carmo, Juan Andrés, Elson Longo
Electron beam irradiation for the formation of thick Ag film on Ag3PO4
João Paulo de Campos da Costa, Marcelo Assis, Vinícius Teodoro, Andre Rodrigues, Camila Cristina de Foggi, Miguel Angel San-Miguel, João Paulo Pereira do Carmo, Juan Andrés, Elson Longo
Fontes
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RSC advances Vol. 10, n. 37, (June, 2020), p. 21745-21753 |