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|Type:||Artigo de periódico|
|Title:||From Photocorrosion To Photoelectrochemical Etching|
|Abstract:||A short report is given on the technique of photoelectrochemical etching. The basic principles and the existing literature on photoetching are reviewed. It appears that this technique has a number of applications in semiconductor characterization, in optics, in electronic devices fabrication and in solar energy conversion devices. Special attention is devoted to the photoelectrochemical etching processes of III-V compound semiconductors and experimental results of the etching of InP are reported. The micro-reliefs obtained on InP by photoetching are described and possible applications are discussed. © 1992.|
|Appears in Collections:||Unicamp - Artigos e Outros Documentos|
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