Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/99744
Type: Artigo de evento
Title: Low Frequency Remote Plasma Rapid Thermal Cvd System With Face Down Electrostatic Clamp Wafer Holder
Author: Bonfim Marlio J.
Swart Jacobus W.
Velasco Christian E.M.
Okura Juscelino H.
Verdonck Patrick B.
Abstract: A multiprocess CVD system with the following main features is designed and constructed: the wafer holder is made of a Si wafer with diameter larger than the process wafers. This larger holder produces a better temperature uniformity on the process wafer. A good thermal contact between holder and process wafer is obtained by an electrostatic clamp. The holder supports the process wafer facing down. A remote plasma is produced in a small chamber inside the process chamber. The 100 KHz RF frequency keeps the system very simple and cheap while still reasonable ionization is achieved. SiO 2 films were deposited using SiH 4 and O 2 with and without remote plasma of O 2. At low temperatures and 1.5 Torr, process activation energies of about 0.9 and 0.3 e V were obtained respectively.
Editor: Publ by Materials Research Society, Pittsburgh, PA, United States
Rights: fechado
Identifier DOI: 
Address: http://www.scopus.com/inward/record.url?eid=2-s2.0-0027867442&partnerID=40&md5=808a47b7bb26f985a7fb58516d6edc03
Date Issue: 1993
Appears in Collections:Unicamp - Artigos e Outros Documentos

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