Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/99402
Type: Artigo de periódico
Title: Transport Properties Of Nitrogen-doped Hydrogenated Amorphous Germanium Films
Author: Zanatta A.R.
Chambouleyron I.
Abstract: This paper discusses experimental data referring to the electronic properties of N-doped hydrogenated amorphous germanium films (a-Ge:H). The a-Ge:H films, prepared by rf sputtering, possess a low density of electronic states in the pseudogap (in the low 1016 cm-3 range) and exhibit a temperature-activated dark conductivity down to below 200 K. It is shown that N atoms incorporated into the a-Ge:H films produce large changes of both the room-temperature dark conductivity and the activation energy. The results of the present work are consistent with the overall picture of the active doping mechanism of group-V elements in tetrahedrally coordinated amorphous semiconductors. The donor level introduced by fourfold-coordinated nitrogen in a-Ge:H is found to be around 50 meV below the conduction-band edge. © 1992 The American Physical Society.
Editor: 
Rights: aberto
Identifier DOI: 10.1103/PhysRevB.46.2119
Address: http://www.scopus.com/inward/record.url?eid=2-s2.0-0006649114&partnerID=40&md5=7c3070cf7f2d78ecdab71f266efaa4cf
Date Issue: 1992
Appears in Collections:Unicamp - Artigos e Outros Documentos

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