Please use this identifier to cite or link to this item:
|Type:||Artigo de periódico|
|Title:||Anodic Niobium Pentoxide Films: Growth And Thickness Determination By In Situ Optoelectrochemical Measurements|
|Abstract:||Data on optical reflectance and anodization voltage, obtained during the galvanostatic anodization of metallic niobium foils in an H3PO4 (1%) solution at room temperature were simultaneously recorded as a function of time, to determine the thickness of the Nb2O5 films formed. From these data, plots of film thickness vs anodization voltage were obtained. A linear relation was always observed and in all cases but one, an angular coefficient of 22 Å V-1 was verified. © 1991.|
|Appears in Collections:||Unicamp - Artigos e Outros Documentos|
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.