Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/99276
Type: Artigo de periódico
Title: Anodic Niobium Pentoxide Films: Growth And Thickness Determination By In Situ Optoelectrochemical Measurements
Author: Juliao J.F.
Chagas J.W.R.
Cesar H.L.
Dias N.L.
Decker F.
Gomes U.U.
Abstract: Data on optical reflectance and anodization voltage, obtained during the galvanostatic anodization of metallic niobium foils in an H3PO4 (1%) solution at room temperature were simultaneously recorded as a function of time, to determine the thickness of the Nb2O5 films formed. From these data, plots of film thickness vs anodization voltage were obtained. A linear relation was always observed and in all cases but one, an angular coefficient of 22 Å V-1 was verified. © 1991.
Editor: 
Rights: fechado
Identifier DOI: 10.1016/0013-4686(91)80008-V
Address: http://www.scopus.com/inward/record.url?eid=2-s2.0-0040389896&partnerID=40&md5=5fb92b9fc9b15ffc862ad74a0bb8d338
Date Issue: 1991
Appears in Collections:Unicamp - Artigos e Outros Documentos

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