Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/98760
Type: Artigo de periódico
Title: Photolysis Wavelength Dependence Of The Effect Of Xenon On The Production Of C2*(d̃3iig) By Ultraviolet Multiphoton Dissociation
Author: Lin C.T.
Avouris Ph.
Thefaine Y.J.
Abstract: We report on the effect of Xe buffer gas on the C2(d̃3IIg→ã3II u) emission which results from the excimer laser-induced multiphonon fragmentation of acetylene, triethylenediamine (Dabco), and benzene. We find that, upon addition of Xe, normal quenching of this emission occurs for 248-nm (KrF) photolysis of the above molecules, while an unusual enhancement is found for 193-nm (ArF) photolysis. Other radical emissions resulting from the same process, e.g., CH(Ã2Δ→X̃2II) and CN(B̃2Σ+→X̃2Σ +), show normal quenching at both wavelengths. The possible mechanisms of this unusual enhancement are discussed. © 1982 American Chemical Society.
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Address: http://www.scopus.com/inward/record.url?eid=2-s2.0-5544271126&partnerID=40&md5=065acc7b58adfeb9a50b351ce0672ed1
Date Issue: 1982
Appears in Collections:Unicamp - Artigos e Outros Documentos

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