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Type: Artigo de periódico
Title: On The Influence Of An External D.c. Substrate Bias On Boron And Phosphorus Doping Efficiencies In A-si:h
Author: Alvarez F.
Chambouleyron I.
Gobbi A.
Mendonca C.
Castro F.L.
Abstract: The influence of a substrate D.C. polarization on the doping efficiency in a-Si:H is reported. Intrinsic layers of solar cells and n-i-n structures were also grown under different substrate polarizations and their influence on i-layer properties is discussed. © 1985.
Rights: fechado
Identifier DOI: 10.1016/0022-3093(85)90714-8
Date Issue: 1985
Appears in Collections:Unicamp - Artigos e Outros Documentos

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