Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/98311
Type: Artigo de periódico
Title: Photoelectron Spectra Of Amorphous Sixhy Alloy Films: The Effect Of Microstructure On The Si-2p Level Shift
Author: Das S.R.
Webb J.B.
De Castro S.C.
Sundaram V.S.
Abstract: Depending on the deposition conditions, amorphous SixH y alloy films prepared by planar rf reactive magnetron sputtering exhibit one of three types of microstructure: (i) type A with no discernible microstructural features down to the 20-Å level and with a smooth uniform density; (ii) type B consisting of high-density regions of 50-200-Å lateral dimensions separated by a low-density network; and (iii) a two-level (type C) microstructure consisting of 300-500-Å dimensions columns separated by a pronounced low-density network. The columns, in turn, are composed of 50-200-Å dimension high-density regions interspersed with low-density network. The Si-2p level in these alloy films, determined by x-ray photoelectron spectroscopy, is observed to be strongly influenced by the microstructure of the film. A shift in the Si-2p level, systematically varying with the hydrogen concentration, is observed in alloy films with type B and type C microstructures. No shift is observed, irrespective of the hydrogen concentration, in alloy films with type A microstructure. The photoelectron spectra are examined in the light of the vibrational spectra of the films as measured by Fourier transform infrared techniques. The dependence of the Si-2p level shift on the microstructure and the variation with hydrogen concentration are explained qualitatively in terms of the differences in the silicon-hydrogen bonding in amorphous SixHy films with dissimilar microstructures.
Editor: 
Rights: aberto
Identifier DOI: 10.1063/1.337116
Address: http://www.scopus.com/inward/record.url?eid=2-s2.0-33644575853&partnerID=40&md5=e63d9d654a15556049c2c84a76574d13
Date Issue: 1986
Appears in Collections:Unicamp - Artigos e Outros Documentos

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