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|Type:||Artigo de periódico|
|Title:||Photoelectron Spectra Of Amorphous Sixhy Alloy Films: The Effect Of Microstructure On The Si-2p Level Shift|
De Castro S.C.
|Abstract:||Depending on the deposition conditions, amorphous SixH y alloy films prepared by planar rf reactive magnetron sputtering exhibit one of three types of microstructure: (i) type A with no discernible microstructural features down to the 20-Å level and with a smooth uniform density; (ii) type B consisting of high-density regions of 50-200-Å lateral dimensions separated by a low-density network; and (iii) a two-level (type C) microstructure consisting of 300-500-Å dimensions columns separated by a pronounced low-density network. The columns, in turn, are composed of 50-200-Å dimension high-density regions interspersed with low-density network. The Si-2p level in these alloy films, determined by x-ray photoelectron spectroscopy, is observed to be strongly influenced by the microstructure of the film. A shift in the Si-2p level, systematically varying with the hydrogen concentration, is observed in alloy films with type B and type C microstructures. No shift is observed, irrespective of the hydrogen concentration, in alloy films with type A microstructure. The photoelectron spectra are examined in the light of the vibrational spectra of the films as measured by Fourier transform infrared techniques. The dependence of the Si-2p level shift on the microstructure and the variation with hydrogen concentration are explained qualitatively in terms of the differences in the silicon-hydrogen bonding in amorphous SixHy films with dissimilar microstructures.|
|Appears in Collections:||Unicamp - Artigos e Outros Documentos|
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