Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/97330
Type: Artigo de periódico
Title: A-siox<er> Active Photonic Crystal Resonator Membrane Fabricated By Focused Ga+ Ion Beam
Author: Figueira D.S.L.
Barea L.A.M.
Vallini F.
Jarschel P.F.
Lang R.
Frateschi N.C.
Abstract: We have fabricated thin erbium-doped amorphous silicon suboxide (a-SiOx<Er>) photonic crystal membrane using focused gallium ion beam (FIB). The photonic crystal is composed of a hexagonal lattice with a H1 defect supporting two quasi-doubly degenerate second order dipole states. 2-D simulation was used for the design of the structure and full 3-D FDTD (Finite-Difference Time-Domain) numerical simulations were performed for a complete analysis of the structure. The simulation predicted a quality factor for the structure of Q = 350 with a spontaneous emission enhancement of 7. Micro photoluminescence measurements showed an integrated emission intensity enhancement of ∼2 times with a Q = 130. We show that the discrepancy between simulation and measurement is due to the conical shape of the photonic crystal holes and the optical losses induced by FIB milling. © 2012 Optical Society of America.
Editor: Optical Society of American (OSA)
Rights: fechado
Identifier DOI: 10.1364/OE.20.018772
Address: http://www.scopus.com/inward/record.url?eid=2-s2.0-84865591560&partnerID=40&md5=db63e8c86f30ad9effbcf3f4c49ce0e9
Date Issue: 2012
Appears in Collections:Unicamp - Artigos e Outros Documentos

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