Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/95773
Type: Artigo de periódico
Title: Hmdso Plasma Polymerization And Thin Film Optical Properties
Author: Mota R.P.
Galvao D.
Durrant S.F.
De Moraes M.A.B.
de Oliveira Dantas S.
Cantao M.
Abstract: Thin films were deposited from hexamethyldisiloxane (HMDSO) in a glow discharge supplied with radiofrequency (rf) power. Actino-metric optical emission spectroscopy was used to follow trends in the plasma concentrations of the species SiH (414.2 nm), CH (431.4 nm), CO (520.0 nm), and H (656.3 nm) as a function of the applied rf power (range 5 to 35 W). Transmission infrared spectroscopy (IRS) was employed to characterize the molecular structure of the polymer, showing the presence of Si-H, Si-O-Si, Si-O-C and C-H groups. The deposition rate, determined by optical interferometry, ranged from 60 to 130 nm/min. Optical properties were determined from transmission ultra violet-visible spectroscopy (UVS) data. The absorption coefficient α, the refractive index n, and the optical gap E04 of the polymer films were calculated as a function of the applied power. The refractive index at a photon energy of 1 eV varied from 1.45 to 1.55, depending on the rf power used for the deposition. The absorption coefficient showed an absorption edge similar to other non-crystalline materials, amorphous hydrogenated carbon, and semiconductors. For our samples, we define as an optical gap, the photon energy E04 corresponding to the energy at an absorption of 104 cm-1. The values of E04 decreased from 5.3 to 4.6 as the rf power was increased from 5 to 35 W. © 1995.
Editor: 
Rights: fechado
Identifier DOI: 10.1016/0040-6090(95)06938-0
Address: http://www.scopus.com/inward/record.url?eid=2-s2.0-0029533793&partnerID=40&md5=fb57daa2d11c8e644946c55421d7e16a
Date Issue: 1995
Appears in Collections:Unicamp - Artigos e Outros Documentos

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