Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/95772
Type: Artigo de periódico
Title: Mechanisms Of Polymer Film Deposition From R.f. Discharges Of Acetylene, Nitrogen And Helium Mixtures
Author: Durrant S.F.
Marcal N.
Castro S.G.
Vinhas R.C.G.
De Moraes M.A.B.
Nicola J.H.
Abstract: Mixtures of C2H2, He and N2 were polymerized in an r.f. discharge. Quantitative optical emission spectroscopy was used to determine relative concentrations of the key species CH and CN in the plasma as a function of the proportions of monomer gases in the feed, and to delineate the behavior of the electron mean energy and number density in the discharge. Transmission IR spectroscopy (IRS) and electron spectroscopy for chemical analysis (ESCA) of films deposited from discharges containing different proportions of nitrogen revealed the incorporation of both CH and CN in the deposited material. Deposition rates were also determined and their connection with deposition mechanisms via gas-phase and surface reactions is outlined. © 1995.
Editor: 
Rights: fechado
Identifier DOI: 10.1016/0040-6090(94)06439-3
Address: http://www.scopus.com/inward/record.url?eid=2-s2.0-0029291054&partnerID=40&md5=450db2b6af0c7dbc05b2e5d01afe844b
Date Issue: 1995
Appears in Collections:Unicamp - Artigos e Outros Documentos

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