Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/95647
Type: Artigo de periódico
Title: A Contribution Of Vibrationally Excited Cl2 Molecules To Gaas Reactive Ion Etching In Cl2/ar
Author: Moshkalyov S.A.
Machida M.
Lebedev S.V.
Campos D.O.
Abstract: The experimental results on GaAs RIE in Cl2/Ar are considered within the framework of the ion-neutral synergy model. It has been shown, that the model gives a good agreement with the etch rate data obtained for low Cl2 partial pressure, but fails at the increased chlorine percentage. A possible contribution of vibrationally excited Cl2 molecules to GaAs etch rate has been considered.
Editor: 
Rights: fechado
Identifier DOI: 
Address: http://www.scopus.com/inward/record.url?eid=2-s2.0-0030195448&partnerID=40&md5=03dd2c8c043bde9b23c1c377cd8c5fa9
Date Issue: 1996
Appears in Collections:Unicamp - Artigos e Outros Documentos

Files in This Item:
File Description SizeFormat 
2-s2.0-0030195448.pdf604.36 kBAdobe PDFView/Open


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.