Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/95106
Type: Artigo de periódico
Title: Dopant Interaction With A Dislocation In Silicon: Local And Non-local Effects
Author: Antonelli A.
Justo J.F.
Fazzio A.
Abstract: We performed a theoretical investigation on the interaction of arsenic impurities with a 30° glide partial dislocation in silicon. Our calculations were performed by ab initio total energy methods, based on the density functional theory and the local density approximation. We find that an arsenic atom, in a crystalline position, gives away one electron to the dislocation, becoming positively charged while the dislocation core is negatively charged. The interaction between arsenic and the core is essentially electrostatic, which leads to arsenic segregation. © 2001 Elsevier Science B.V. All rights reserved.
Editor: 
Rights: fechado
Identifier DOI: 10.1016/S0921-4526(01)00743-8
Address: http://www.scopus.com/inward/record.url?eid=2-s2.0-0035670852&partnerID=40&md5=7bcb8772cac7aa0cdcd8bae8f1991509
Date Issue: 2001
Appears in Collections:Unicamp - Artigos e Outros Documentos

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