Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/95035
Type: Artigo de periódico
Title: Transport And Magnetotransport Properties Of Co Thin Films On Si
Author: Pakhomov A.B.
Denardin J.C.
De Lima O.F.
Knobel M.
Missell F.P.
Abstract: Resistance, magnetoresistance and Hall effect were studied in sputtered, cobalt films of varying thickness, deposited on silicon substrates, in the temperature range of 5-350 K and magnetic field up to 7 T. Contributions from both metallic cobalt and sillicide layers are revealed. The latter undergo a metal-insulator transition in the temperature range of 260-280 K. © 2001 Elsevier Science B.V. All rights reserved.
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Rights: fechado
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Address: http://www.scopus.com/inward/record.url?eid=2-s2.0-33748686358&partnerID=40&md5=4d2a9790c7ecff4a06821067242d0a01
Date Issue: 2001
Appears in Collections:Unicamp - Artigos e Outros Documentos

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