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|Type:||Artigo de evento|
|Title:||Control Of Micron And Submicron Feature Dimensions In 2μm Resolution Photolithographic System For Mos And Mems Applications|
|Author:||Fioravante Jr. N.P.|
|Abstract:||The development of new devices with micron and submicron dimensions requires an accurate photolithographic process steps control. The requirements are different for isolated and periodic/high-density structures. Characterization of a lithographic patterning process are presented, and the conditions of the process are optimized to obtain repetitive pattern transfer for micron and submicron scale technology with high accuracy using the equipments conventionally employed for 2 μm technology. It has been also shown that the technology in the over-exposure regime can be used to obtain -100 nm line structures.|
|Appears in Collections:||Unicamp - Artigos e Outros Documentos|
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