Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/94740
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dc.contributor.CRUESPUNIVERSIDADE DE ESTADUAL DE CAMPINASpt_BR
dc.identifier.isbnnullpt
dc.typeArtigo de eventopt_BR
dc.titleUse Of A Langmuir Probe For Ecr Plasma Characterizationpt_BR
dc.contributor.authorDaltrini A.M.pt_BR
dc.contributor.authorMoshkalyov S.A.pt_BR
dc.contributor.authorRamos A.C.S.pt_BR
dc.contributor.authorSwart J.W.pt_BR
unicamp.authorDaltrini, A.M., Centra de Componentes Semicondutores, Universidade Estadual de Campinas, C.P. 6061, Campinas, SP, Brazilpt_BR
unicamp.authorMoshkalyov, S.A., Centra de Componentes Semicondutores, Universidade Estadual de Campinas, C.P. 6061, Campinas, SP, Brazilpt_BR
unicamp.authorRamos, A.C.S., Institute de Fisica Gleb Wataghin, Universidade Estadual de Campinas, CEP 13083-970, Campinas, SP, Brazilpt_BR
unicamp.authorSwart, J.W., Centra de Componentes Semicondutores, Universidade Estadual de Campinas, C.P. 6061, Campinas, SP, Brazilpt_BR
dc.description.abstractA Langmuir electric probe which can be used in single, double and triple probe configurations, was installed in a high density electron cyclotron resonance (ECR) plasma reactor. The first results for electron temperature and density for different gases (Ar and Ar/N2), pressures and microwave power are presented.en
dc.relation.ispartofProceedings - Electrochemical Societypt_BR
dc.publishernullpt_BR
dc.date.issued2004pt_BR
dc.identifier.citationProceedings - Electrochemical Society. , v. 3, n. , p. 375 - 380, 2004.pt_BR
dc.language.isoenpt_BR
dc.description.volume3pt_BR
dc.description.issuenumberpt_BR
dc.description.initialpage375pt_BR
dc.description.lastpage380pt_BR
dc.rightsfechadopt_BR
dc.sourceScopuspt_BR
dc.identifier.issnpt_BR
dc.identifier.doipt_BR
dc.identifier.urlhttp://www.scopus.com/inward/record.url?eid=2-s2.0-17044361859&partnerID=40&md5=8a41ceed365e8e1df3707ef04fd2dce6pt_BR
dc.date.available2015-06-26T14:25:23Z
dc.date.available2015-11-26T14:15:07Z-
dc.date.accessioned2015-06-26T14:25:23Z
dc.date.accessioned2015-11-26T14:15:07Z-
dc.description.provenanceMade available in DSpace on 2015-06-26T14:25:23Z (GMT). No. of bitstreams: 0 Previous issue date: 2004en
dc.description.provenanceMade available in DSpace on 2015-11-26T14:15:07Z (GMT). No. of bitstreams: 0 Previous issue date: 2004en
dc.identifier.urihttp://www.repositorio.unicamp.br/handle/REPOSIP/94740
dc.identifier.urihttp://repositorio.unicamp.br/jspui/handle/REPOSIP/94740-
dc.identifier.idScopus2-s2.0-17044361859pt_BR
dc.description.referenceLangmuir, I., Mott-Smith, H., (1924) Gen. Eletr. Rev., 27, p. 449pt_BR
dc.description.referenceChen, F.F., (1965) Plasma Diagnostic Techniques, , R. H Huddiestone and S. L. Leonard, Editors, Academic Press, New Yorkpt_BR
dc.description.referenceWang, G., (2000) Plasma Phys. Control. Fusion, 42, p. 127pt_BR
dc.description.referenceMoshkalyov, S.A., Diniz, J.A., Swart, J.W., Machida, M., (1997) J. Vac. Sci. Technol. A, 15, p. 2682pt_BR
dc.description.referenceBetanzo, C.R., (2003), PhD Thesis, FEEC/UNICAMPTanaka, M.Y., Bacal, M., Sasao, M., Kuroda, T., (1998) Rev. Sci. Intrum., 69, p. 980pt_BR
dc.description.referenceDeenamma Vargheese, K., Mohan Rao, G., (2000) Rev. Sci. Intrum., 71, p. 467pt_BR
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