Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/93311
Type: Artigo de periódico
Title: Modification Of Electrode Materials For Plasma Torches
Author: Jankov I.R.
Szente R.N.
Goldman I.D.
Carreno M.N.P.
Valle M.A.
Behar M.
Costa C.A.R.
Galembeck F.
Landers R.
Abstract: As part of the studies of new materials to be used as electrodes for plasma torches, polycrystalline copper thin film substrates, obtained by depositing copper on silicon wafer using the Electron Beam technique, were implanted with low energy (20-50 keV) alkali ions. The samples, before and after implantation process, were analysed in terms of surface composition and work function changes. Although the implantation doses were low (3×1015 ions/cm2), relatively high concentrations of alkali metals were detected on the surface, which yielded a work function decrease of 3-9% in relation to the copper value. © 2005 Elsevier B.V. All rights reserved.
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Rights: fechado
Identifier DOI: 10.1016/j.surfcoat.2005.02.015
Address: http://www.scopus.com/inward/record.url?eid=2-s2.0-24644495675&partnerID=40&md5=a95a1486a6e9f24ac0a6d3ddbf4fe1a5
Date Issue: 2005
Appears in Collections:Unicamp - Artigos e Outros Documentos

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