Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/91101
Type: Artigo de periódico
Title: Diamond-like Carbon Deposited By Plasma Technique As A Function Of Methane Flow Rate
Author: Viana G.A.
Motta E.F.
Da Costa M.E.H.M.
Freire Jr. F.L.
Marques F.C.
Abstract: Diamond-like carbon (a-C:H) prepared by plasma enhanced chemical vapor deposition (PECVD) as a function of methane gas flow rate is reported. Films deposited at zero flow rate, i.e., without the use of vacuum pumps during the deposition, are also investigated. For that purpose, the reactor chamber was baked and pumped down to about 10-8 Torr to reduce contamination released from the reactor walls. The films were analyzed by visible, infrared and Raman spectroscopes. It was observed that the deposition rate, hydrogen concentration and optical gap depend on the methane gas flow rate. A maximum for deposition rate found at methane flow was much smaller than the flow usually adopted in conventional procedures. © 2010 Elsevier B.V. All rights reserved.
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Rights: fechado
Identifier DOI: 10.1016/j.diamond.2010.01.043
Address: http://www.scopus.com/inward/record.url?eid=2-s2.0-77955230234&partnerID=40&md5=63bd8c4720a3f3b7a8768715d59118b6
Date Issue: 2010
Appears in Collections:Unicamp - Artigos e Outros Documentos

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