Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/91040
Type: Artigo de periódico
Title: Effects Of Helium Ion Irradiation On Fluorinated Plasma Polymers
Author: Lopes B.B.
Schreiner W.
Davanzo C.U.
Durrant S.F.
Abstract: The effects of ion irradiation on fluorinated plasma polymer films are investigated using profilometry, surface contact-angle measurements, infrared reflection absorption spectroscopy (IRRAS) and X-ray photoelectron spectroscopy (XPS). Remarkably, helium plasma immersion ion implantation (PIII) of several amorphous hydrogenated fluorinated plasma polymers deposited from C2H2-SF6, C6H6-SF6 or C6F6 produces film compactions of up to 40%, and modifies the surface energy in the 35 to 65dyn cm-1 range. As revealed by IRRAS and XPS, the films contain C-H, C-C, C=C, C=O, O-H and C-F groups. XPS spectra confirm the presence of N (typically ~5%). The films produced from SF6-containing plasmas also contain S. For irradiation times of 80min, the film carbon content is increased, and the fluorine content is greatly reduced, by factors of about 3 to 15, depending on the initial film composition. © 2010 Elsevier B.V.
Editor: 
Rights: fechado
Identifier DOI: 10.1016/j.surfcoat.2010.02.016
Address: http://www.scopus.com/inward/record.url?eid=2-s2.0-77953358596&partnerID=40&md5=0f1535f716d8f401f81f29caf300f120
Date Issue: 2010
Appears in Collections:Unicamp - Artigos e Outros Documentos

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