Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/90229
Type: Artigo de periódico
Title: Induced Optical Losses In Optoelectronic Devices Due Focused Ion Beam Damages
Author: Vallini F.
Barea L.A.M.
dos Reis E.F.
von Zuben A.A.
Frateschi N.C.
Abstract: A study of damages caused by gallium focused ion beam (FIB) into III-V compounds is presented. Potential damages caused by local heating, ion implantation, and selective sputtering are presented. Preliminary analyzes shows that local heating is negligible. Gallium implantation is shown to occur over areas tens of nanometers thick. Gallium accumulation as well as selective sputtering during III-V compounds milling is expected. Particularly, for GaAs, this effect leads to gallium segregation and formation of metallic clusters. Microdisks resonators are fabricated using FIB milling with different emission currents to analyze these effects on a device. It is shown that for higher emission current, thus higher implantation doses, the cavity quality factor rapidly decreases due optical scattering losses induced by implanted gallium atoms.
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Rights: fechado
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Address: http://www.scopus.com/inward/record.url?eid=2-s2.0-84869995299&partnerID=40&md5=ad9959a2b604b36a9256a399e8d0c3cb
Date Issue: 2012
Appears in Collections:Unicamp - Artigos e Outros Documentos

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