Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/89047
Type: Capítulo de livro
Title: Ultimate Resolution Achievable With Focused Ion Beams: Comparing Computer Simulations With Practical Process
Author: Turatti L.G.
Swart J.W.
Vaz A.R.
Moshkalev S.A.
Abstract: Simulation results for Ga ion beam interaction with thin membranes of different materials (C, Si, Pt) are presented. Experiments with ion beam irradiation were carried out at different doses with suspended 50-100 nm thick multi-layer graphene (MLG) flakes. Cross-sectioning using focused ion beam milling revealed that material removal occurs in areas 60-80 nm wide at the beam lateral dimension of 20 nm, being consistent with the results of TRIM simulations. Further studies with thinner MLG samples are in progress to achieve better ion beam processing resolution. © 2013 Nova Science Publishers, Inc. All rights reserved.
Editor: Nova Science Publishers, Inc.
Rights: fechado
Identifier DOI: 
Address: http://www.scopus.com/inward/record.url?eid=2-s2.0-84896437248&partnerID=40&md5=e510fd44fb99f8714ca5c30bbf39946f
Date Issue: 2013
Appears in Collections:Unicamp - Artigos e Outros Documentos

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