Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/87025
Type: Artigo de periódico
Title: On The Hydrogenated Silicon Carbide (sicx:h) Interlayer Properties Prompting Adhesion Of Hydrogenated Amorphous Carbon (a-c:h) Deposited On Steel
Author: Cemin F.
Bim L.T.
Menezes C.M.
Aguzzoli C.
Maia Da Costa M.E.H.
Baumvol I.J.R.
Alvarez F.
Figueroa C.A.
Abstract: This work reports a systematic study of physical-chemical properties of SiCx:H interlayers deposited by using tetramethlysilane on AISI 4140 at different temperatures (100 °C-550 °C) and its effects on the adhesion of a-C:H thin films. The bi-layers were obtained by pulsed-DC PECVD assisted by electrostatic confinement. The results show that the thickness of the SiCx:H interlayer exponentially decreases as the deposition temperature increases, i.e., a thermally activated kinetic process controls the global chemical reaction in the interlayer. There is a transition temperature (∼300 °C) for interlayer deposition where adhesion of a-C:H is reached. Above ∼300 °C, the a-C:H thin films show critical loads to wedge spallation from 298 (300 °C) to 478 mN (550 °C). At higher temperatures, H and Si contents decrease whereas C content increases in the interlayer. The improved adhesion is associated with the nature of chemical bonds formed in the interlayer. © 2014 Elsevier Ltd. All rights reserved.
Editor: Elsevier Ltd
Rights: fechado
Identifier DOI: 10.1016/j.vacuum.2014.07.015
Address: http://www.scopus.com/inward/record.url?eid=2-s2.0-84905391683&partnerID=40&md5=181c5f13a455871c8082c0273239f197
Date Issue: 2014
Appears in Collections:Unicamp - Artigos e Outros Documentos

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