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Type: Artigo de periódico
Title: Influence Of Photo-curing Distance On Bond Strength And Nanoleakage Of Self-etching Adhesive Bonds To Enamel And Dentin
Author: Pimenta De Araujo C.T.
Prieto L.T.
Lima A.F.
Souza-Junior E.J.
Dias C.T.S.
Paulillo L.A.M.S.
Abstract: Objectives. To assess the influence of light-curing unit tip distance on the microtensile bond strength (μTBS) and nanoleakage of self-etching adhesives to enamel and dentin. Materials and methods. Flat buccal surfaces were prepared on 198 bovine incisors. The teeth were randomly assigned into nine groups for μTBS (n = 8) and nanoleakage (n = 3) testing according to the adhesive system (Clearfil Protect Bond, Clearfil Tri-S Bond or One Up Bond F Plus) and distance from the light-curing tip (0, 3 or 6 mm). The bonded samples were tested in tension (0.5 mm/min) and nanoleakage was analyzed using SEM. Results. Clearfil Protect Bond exhibited the highest tensile strength on both enamel and dentin. Leakage was higher in samples exposed at a distance of 6 mm on enamel and 0 mm on dentin. One Up Bond F Plus experienced the greatest amount of nanoleakage on both substrates. Conclusions. Light-curing unit distance did not influence the μTBS of the adhesives, but nanoleakage increased on enamel samples when photoactivation occurred at a distance of 6 mm. © 2014 Informa Healthcare.
Rights: fechado
Identifier DOI: 10.3109/00016357.2013.805431
Date Issue: 2014
Appears in Collections:Unicamp - Artigos e Outros Documentos

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