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|Type:||Artigo de periódico|
|Title:||Dielectric Mismatch And Shallow Donor Impurities In Gan/hfo2 Quantum Wells|
|Abstract:||In this work we investigate electron-impurity binding energy in GaN/HfO2 quantum wells. The calculation considers simultaneously all energy contributions caused by the dielectric mismatch: (i) image self-energy (i.e., interaction between electron and its image charge), (ii) the direct Coulomb interaction between the electron-impurity and (iii) the interactions among electron and impurity image charges. The theoretical model account for the solution of the time-dependent Schrödinger equation and the results shows how the magnitude of the electron-impurity binding energy depends on the position of impurity in the well-barrier system. The role of the large dielectric constant in the barrier region is exposed with the comparison of the results for GaN/HfO2 with those of a more typical GaN/AlN system, for two different confinement regimes: narrow and wide quantum wells.|
|Appears in Collections:||Unicamp - Artigos e Outros Documentos|
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