Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/80242
Type: Artigo de periódico
Title: Influence of photo-curing distance on bond strength and nanoleakage of self-etching adhesive bonds to enamel and dentin
Author: de Araujo, CTP
Prieto, LT
Lima, AF
Souza, EJ
Dias, CTS
Paulillo, LAMS
Abstract: Objectives. To assess the influence of light-curing unit tip distance on the microtensile bond strength (mu TBS) and nanoleakage of self-etching adhesives to enamel and dentin. Materials and methods. Flat buccal surfaces were prepared on 198 bovine incisors. The teeth were randomly assigned into nine groups for mu TBS (n = 8) and nanoleakage (n = 3) testing according to the adhesive system (Clearfil Protect Bond, Clearfil Tri-S Bond or One Up Bond F Plus) and distance from the light-curing tip (0, 3 or 6 mm). The bonded samples were tested in tension (0.5 mm/min) and nanoleakage was analyzed using SEM. Results. Clearfil Protect Bond exhibited the highest tensile strength on both enamel and dentin. Leakage was higher in samples exposed at a distance of 6 mm on enamel and 0 mm on dentin. One Up Bond F Plus experienced the greatest amount of nanoleakage on both substrates. Conclusions. Light-curing unit distance did not influence the mu TBS of the adhesives, but nanoleakage increased on enamel samples when photoactivation occurred at a distance of 6 mm.
Subject: Microtensile bond strength
photoactivation
nanoleakage
Country: Inglaterra
Editor: Informa Healthcare
Rights: fechado
Identifier DOI: 10.3109/00016357.2013.805431
Date Issue: 2014
Appears in Collections:Unicamp - Artigos e Outros Documentos

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