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|Type:||Artigo de periódico|
|Title:||Synthesis of polymer films by an electron emission CVD technique|
de Moraes, MAB
|Abstract:||A low-pressure chemical vapor deposition (CVD) technique based on the formation of reactive film precursors by dissociation of gas-phase reactants by electron impact is described. The electrons are emitted by a hot filament and a positive bias voltage applied to the substrate provides control of the emission current. The emitted electrons are primarily responsible for the gas dissociation, but secondary electrons resulting from electron-impact ionization of the gas molecules also produce reactive species, contributing to the deposition process. This technique was used to synthesize polymer films from C2H2-N-2 mixtures at pressures ranging from 1-10 Pa. The dependencies of the current collected by the substrate, Is, on the substrate bias voltage, Vs, and on the gas pressure were determined. The film deposition rate was measured as a function of several deposition variables such as I-s, V-S, and the N-2 to C2H2 flow rate ratio. Oxygen was present in the films as a contaminant. Analyses by Fourier transform infrared spectroscopy and X-ray photoelectron spectroscopy (XPS) provided insight into the film molecular structure, allowing identification of various functional groups and binding states of the C- and N-atoms. From the XPS spectra, the N/C and O/C ratios were determined.|
|Editor:||Kluwer Academic/plenum Publ|
|Appears in Collections:||Unicamp - Artigos e Outros Documentos|
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