Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/78516
Type: Artigo de periódico
Title: Cathodic behavior of co-sputtered Cu/V oxides thin films
Author: Souza, EA
Landers, R
Tabacniks, MH
Cardoso, LP
Gorenstein, A
Abstract: In this paper, Cu/V oxide thin films were prepared by reactive d.c./r.f. co-sputtering. Nanostructured films were obtained and their composition and crystallinity were investigated. The electrochemical behavior of the thin film electrodes was studied, in order to evaluate their performance as cathodes in miniaturized systems. The behavior of the mixed oxide films and the pure vanadium pentoxide in thin film form are compared. All films presented a high insertion capacity in the first cycle. The film with composition CU4.0VO5.5 presented the highest capacity and stability in comparison with all the other films. (c) 2006 Elsevier Ltd. All rights reserved.
Subject: copper-vanadium oxide
microbattery
thin film electrode
sputtering
intercalation
Country: Inglaterra
Editor: Pergamon-elsevier Science Ltd
Rights: fechado
Identifier DOI: 10.1016/j.electata.2006.03.024
Date Issue: 2006
Appears in Collections:Unicamp - Artigos e Outros Documentos

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