Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/77595
Type: Artigo de periódico
Title: ANODIC NIOBIUM PENTOXIDE FILMS - GROWTH AND THICKNESS DETERMINATION BY INSITU OPTOELECTROCHEMICAL MEASUREMENTS
Author: JULIAO, JF
CHAGAS, JWR
CESAR, HL
DIAS, NL
DECKER, F
GOMES, UU
Abstract: Data on optical reflectance and anodization voltage, obtained during the galvanostatic anodization of metallic niobium foils in an H3PO4(1%) solution at room temperature were simultaneously recorded as a function of time, to determine the thickness of the Nb2O5 films formed. From these data, plots of film thickness vs anodization voltage were obtained. A linear relation was always observed and in all cases but one, an angular coefficient of 22 angstrom V-1 was verified.
Subject: ANODIZATION
INTERFERENCE
INTERFACE INTERFEROMETRY
OXIDE
Country: Inglaterra
Editor: Pergamon-elsevier Science Ltd
Rights: fechado
Identifier DOI: 10.1016/0013-4686(91)80008-V
Date Issue: 1991
Appears in Collections:Unicamp - Artigos e Outros Documentos

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