Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/75376
Type: Artigo de periódico
Title: Structure determination of three-dimensional hafnium silicide nano structures on Si(100) by means of X-ray photoelectron diffraction
Author: Fluchter, CR
de Siervo, A
Weier, D
Shurmann, M
Beimborn, A
Dreiner, S
Carazzolle, MF
Landers, R
Kleiman, GG
Westphal, C
Abstract: We propose a modified zirconium silicide model for the structure of HfSi2 islands on Si(100). We studied this system in a combined investigation by means of photoelectron diffraction (XPD), photoelectron spectroscopy and atomic force microscopy. Synchrotron radiation was used for enhanced energy resolution and Surface sensitivity. Calculated XPD patterns of model clusters reflecting the structure as well as the morphology of the islands exhibit an excellent agreement with the experimental results. From LEED and AFM measurements a preferential nano structure growth along the [011] and [0 (1) over bar1] direction was observed. Complementary XPD results clearly show that the HfSi2 structures are silicon terminated. (C) 2008 Elsevier B.V. All rights reserved.
Subject: High-k
Nanowires
Photoelectron spectroscopy
Photoelectron diffraction
AFM
Country: Holanda
Editor: Elsevier Science Bv
Rights: fechado
Identifier DOI: 10.1016/j.susc.2008.09.033
Date Issue: 2008
Appears in Collections:Artigos e Materiais de Revistas Científicas - Unicamp

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