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|Type:||Artigo de periódico|
|Title:||Study of conditions for anisotropic plasma etching of tungsten and tungsten nitride using SF6/Ar gas mixtures|
|Abstract:||Results of the study of reactive ion etching of tungsten, tungsten nitride, and silicon in SF6/Ar gas mixtures are presented. For plasma diagnostics, optical emission spectroscopy (actinometry) was used. Using the actinometry technique, it was possible to show that etching mechanisms were different for Si-F and W-F chemistries. Anisotropic etching of tungsten/tungsten nitride using conventional reactive ion etcher has been obtained, and conditions of achieving anisotropic etching have been analyzed. A correlation is found between anisotropy of tungsten etching and the ratio of Si/W etch rates. Mechanisms of fluorine redistribution between the bottom/sidewall surfaces due to surface diffusion and/or reflection are proposed as possible reasons for the observed correlation.|
|Editor:||Electrochemical Soc Inc|
|Citation:||Journal Of The Electrochemical Society. Electrochemical Soc Inc, v. 149, n. 3, n. G179, n. G183, 2002.|
|Appears in Collections:||Unicamp - Artigos e Outros Documentos|
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