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Type: Artigo de periódico
Title: SU-8 submicrometric sieves recorded by UV interference lithography
Author: Gutierrez-Rivera, LE
Cescato, L
Abstract: Sieves are promising devices for filtration, separation of particles and drug delivery control because of their uniform pore size distribution and low flow resistance. SU-8 is a negative photoresist type epoxy that is hydrophobic and biocompatible. Thus, it is a good alternative to fabricate micro devices for biological applications. In this paper we show a novel fabrication technique of self-sustained sieves of an SU-8 photoresist, with pore dimensions in the range of hundreds of nanometers, using a combination of UV interference and conventional optical lithographies. The resulting sieves are SU-8 membranes with submicrometric pore sizes and coefficient of variation of 7%, in areas of 1 cm(2).
Country: Inglaterra
Editor: Iop Publishing Ltd
Citation: Journal Of Micromechanics And Microengineering. Iop Publishing Ltd, v. 18, n. 11, 2008.
Rights: fechado
Identifier DOI: 10.1088/0960-1317/18/11/115003
Date Issue: 2008
Appears in Collections:Unicamp - Artigos e Outros Documentos

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