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|Type:||Artigo de periódico|
|Title:||SU-8 submicrometric sieves recorded by UV interference lithography|
|Abstract:||Sieves are promising devices for filtration, separation of particles and drug delivery control because of their uniform pore size distribution and low flow resistance. SU-8 is a negative photoresist type epoxy that is hydrophobic and biocompatible. Thus, it is a good alternative to fabricate micro devices for biological applications. In this paper we show a novel fabrication technique of self-sustained sieves of an SU-8 photoresist, with pore dimensions in the range of hundreds of nanometers, using a combination of UV interference and conventional optical lithographies. The resulting sieves are SU-8 membranes with submicrometric pore sizes and coefficient of variation of 7%, in areas of 1 cm(2).|
|Editor:||Iop Publishing Ltd|
|Citation:||Journal Of Micromechanics And Microengineering. Iop Publishing Ltd, v. 18, n. 11, 2008.|
|Appears in Collections:||Unicamp - Artigos e Outros Documentos|
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