Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/73516
Type: Artigo de periódico
Title: The influence of the ion current density on plasma nitriding process
Author: Ochoa, EA
Figueroa, CA
Alvarez, F
Abstract: In this paper, we report a comprehensive nitriding study carried out using low-alloy steel AISI 4140, combining nitrogen ion-beam (IB) implantation and pulsed plasma (PP) nitriding. Quantitative relationships among hardness, nitrogen bulk profile concentration, and current ion densities are reported. The hardness profile showed a linear relationship with the nitrogen concentration. The samples were characterized by photoemission electron spectroscopy (XPS), X-rays diffiraction analysis (XRD), scanning electron microscopy (SEM) and in-depth nanohardness measurements. Samples treated by ion-bearn-implantation showed the presence of a compound layer formed principally by epsilon-Fe3N and gamma'-Fe4N. On the other hand, samples treated by pulsed plasma nitriding showed only the existence of gamma'-Fe4N. In the later set of samples, was possible to prove that hardness is proportional to the ion current density. (c) 2004 Elsevier B.V All rights reserved.
Subject: nitriding
hardness
ionic implantation
Country: Suíça
Editor: Elsevier Science Sa
Rights: fechado
Identifier DOI: 10.1016/j.surfcoat.2004.09.004
Date Issue: 2005
Appears in Collections:Unicamp - Artigos e Outros Documentos

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