Please use this identifier to cite or link to this item:
Type: Artigo de periódico
Title: WO3 pillar-type and helical-type thin film structures to be used in microbatteries
Author: Figueroa, R
Cruz, TGS
Gorenstein, A
Abstract: In the present study WO3 thin films were deposited by sputtering onto ITO glass, W/ITO and Si substrates by using the glancing angle deposition (GLAD) technique, with the objective of applying these materials in electrochemical intercalation devices. The thin films microstructure and electrochemical behavior were determined through scanning electron microscopy (SEM) and cycling at constant current with potential limitation. By mainly adjusting the substrate holder speed rotation, pillar-type and helical-type structures were obtained under high and low speed rotation levels. respectively. The electrochemical results showed that the best charge capacity performance was obtained for the WO3/W/ITO films with pillar-type structures, which are more porous. (C) 2007 Elsevier B.V. All rights reserved.
Subject: tungsten oxide
reactive sputtering
thin films
Country: Holanda
Editor: Elsevier Science Bv
Rights: fechado
Identifier DOI: 10.1016/j.jpowsour.2007.05.080
Date Issue: 2007
Appears in Collections:Artigos e Materiais de Revistas Científicas - Unicamp

Files in This Item:
File Description SizeFormat 
WOS000250490600053.pdf770.59 kBAdobe PDFView/Open

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.