Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/71276
Type: Artigo de periódico
Title: Secondary Electron Contrast Modulation in SU-8 Photoresist Films Exposed Holographically
Author: Avila, LF
Gutierrez-Rivera, L
Cescato, L
Abstract: We report a Secondary Electron (SE) contrast modulation observed in scanning electron microscope photographs of the cross-section of SU-8 photoresist films exposed holographically. The modulation occurs along the whole depth of the sample and its contrast disappears when the samples are submitted to the post exposure bake (PEB). Diffraction and atomic force microscopy measurements of the samples were performed before and after PEB to investigate this modulation. The results indicate that this SE emission contrast modulation comes from the spatial chemical modulation generated by the photolysis during the exposure of the SU-8 films. (C) 2009 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 48: 226-230, 2010
Subject: atomic force microscopy (AFM)
cationic polymerization
holography
photoresists
scanning electron microscopy
Country: EUA
Editor: John Wiley & Sons Inc
Rights: fechado
Identifier DOI: 10.1002/polb.21865
Date Issue: 2010
Appears in Collections:Unicamp - Artigos e Outros Documentos

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