Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/68594
Type: Artigo de periódico
Title: Hardness and stress of amorphous carbon films deposited by glow discharge and ion beam assisting deposition
Author: Marques, FC
Lacerda, RG
Abstract: The hardness and stress of amorphous carbon films prepared by glow discharge and by ion beam assisting deposition are investigated. Relatively hard and almost stress free amorphous carbon films were deposited by the glow discharge technique. On the other hand, by using the ion beam assisting deposition, hard films were also obtained with a stress of the same order of those found in tetrahedral amorphous carbon films. A structural analysis indicates that all films are composed of a sp(2)-rich network. These results contradict the currently accepted concept that both stress and hardness are only related to the concentration Of sp(3) sites. Furthermore, the same results also indicate that the sp(2) sites may also contribute to the hardness of the films.
Country: Brasil
Editor: Sociedade Brasileira Fisica
Rights: fechado
Identifier DOI: 10.1590/S0103-97332000000300008
Date Issue: 2000
Appears in Collections:Artigos e Materiais de Revistas Científicas - Unicamp

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