Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/68521
Type: Artigo de periódico
Title: Growth study of Cu/Pd(111) by RHEED and XPS
Author: de Siervo, A
Paniago, R
Soares, EA
Pfannes, HD
Landers, R
Kleiman, GG
Abstract: An X-ray photoelectron spectroscopy (XPS) and reflection high-energy electron diffraction (RHEED) investigation of the growth of Cu films on a Pd(1 11) single crystal at room temperature is presented. Dynamically taken XPS-data as function of the deposition time show a linear variation of ICu-3pIIPd-(3d) and a periodic change of its slope indicating a nearly layer-by-layer growth process. RHEED oscillations are seen for the 3-4 first layers, also suggesting a smooth growth mode. From the evolution of the RHEED-streaks separation the in-plane Cu-atom spacing is precisely determined. Up to a coverage of ca. 2-3 monolayers (ML) Cu grows pseudomorphously on Pd(1 11), despite the -7.1% strain imposed by the substrate lattice parameter. Non-pseudomorphous epitaxial growth is evidenced above ca. 3-4 ML by a discontinuous change in lateral lattice spacing observed by RHEED which indicates a relaxation to the Cu(1 11) "natural" surface lattice parameter. In addition it is concluded that surface alloying does not take place at least at room temperature (RT)-XPS spectra taken dynamically during annealing show that alloying occurs only above RT. (C) 2004 Elsevier B.V. All rights reserved.
Subject: copper
palladium
low index single crystal surfaces
molecular beam epitaxy
reflection high-energy electron diffraction
(RHEED)
alloying
Country: Holanda
Editor: Elsevier Science Bv
Rights: fechado
Identifier DOI: 10.1016/j.susc.2004.11.028
Date Issue: 2005
Appears in Collections:Unicamp - Artigos e Outros Documentos

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