Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/66643
Type: Artigo de periódico
Title: Fabrication of silicon field-emission arrays using masks of amorphous hydrogenated carbon films
Author: Takeuti, DF
Tirolli, MN
Danieli, CL
Alves, MAR
Braga, ES
de Faria, PHL
Abstract: A fabrication process of silicon field-emission arrays is reported, in which thin films of amorphous hydrogenated carbon (a-C:H) are employed as masks in a two-step plasma-etching process, using pure SF6 and a mixture of SF6 and O-2. In comparison with processes that involve SiO2 masks, the use of a-C:H improved the selectivity of the plasma etching, particularly in the case of pure SF6. An estimation of Utsumi's figure of merit showed that a significant enhancement in electric field can be achieved, as a result of the sharp tips fabricated through this process. (c) 2006 Published by Elsevier Ltd.
Subject: field-emission devices
amorphous hydrogenated carbon
plasma etching
Country: Inglaterra
Editor: Elsevier Sci Ltd
Rights: fechado
Identifier DOI: 10.1016/j.mejo.2006.10.003
Date Issue: 2007
Appears in Collections:Unicamp - Artigos e Outros Documentos

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