Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/66642
Type: Artigo de periódico
Title: Fabrication of sharp silicon tips employing anisotropic wet etching and reactive ion etching
Author: Alves, MAR
Takeuti, DF
Braga, ES
Abstract: We developed a process to obtain sharper silicon tips by employing anisotropic etching in a KOH solution followed by SF6 plasma etch. The tips were further sharpened using the established thermal oxidation technique to decrease the cone angle and, therefore, obtain smaller curvature radii. We have analyzed the impact of such changes in geometry on a figure of merit associated with the field emission characteristics. An increase in the figure of merit by a factor of three was found in relation to the tips before sharpening. (C) 2004 Elsevier Ltd. All rights reserved.
Subject: silicon tip arrays
wet etching
plasma etching
thermal oxidation
Country: Inglaterra
Editor: Elsevier Sci Ltd
Rights: fechado
Identifier DOI: 10.1016/j.mejo.2004.10.004
Date Issue: 2005
Appears in Collections:Unicamp - Artigos e Outros Documentos

Files in This Item:
File Description SizeFormat 
WOS000226566900007.pdf230.34 kBAdobe PDFView/Open


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.