Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/65441
Type: Artigo de periódico
Title: Electrical activation of carbon in GaAs: Implantation temperature effects
Author: Danilov, I
de Souza, JP
Murel, AV
Pudenzi, MAA
Abstract: Carbon was implanted into GaAs at the energy of 1 MeV with doses between 1 x 10(13) and 2 x 10(15) cm(-2) at temperatures of 80 K, nominal room temperature (RT), and 300 degreesC. A markedly higher electrical activation was obtained in the samples implanted at 80 K compared to those implanted at RT or 300 degreesC, attaining a maximum hole concentration of 2 x 10(19) cm(-3). The redistribution of the C profile during rapid thermal annealing at temperatures from 700 to 950 degreesC for 10 s was found negligible, independently of the implantation temperature. Similar improvements in the electrical properties were also verified in samples implanted at 80 K with a lower energy of 60 keV. We consider that despite the light mass of C ions, the reduced dynamic annealing at 80 K allows the accumulation of an abundance of As vacancies, which assist the C activation as a p-type dopant. (C) 2001 American Institute of Physics.
Country: EUA
Editor: Amer Inst Physics
Rights: aberto
Identifier DOI: 10.1063/1.1356729
Date Issue: 2001
Appears in Collections:Unicamp - Artigos e Outros Documentos

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