Please use this identifier to cite or link to this item:
Type: Artigo de periódico
Title: Effects of plasma etching on surface modification and gas permeability of bisphenol-A polycarbonate films
Author: Chinellato, AC
Vidotti, SE
Moraes, MB
Pessan, LA
Abstract: The surface fluorination of polycarbonate bisphenol-A thin films was carried out by treatment with plasma of sulfur hexafluoride/argon (SF6/Ar) using a radio frequency (RF) discharges. Effects of treatment time and SF6 concentration have been studied. Surface characterization was performed using X-ray photoelectron spectroscopy (XPS), Fourier transform infrared spectroscopy with attenuated total reflectance (FT-IR/ATR), atomic force microscopy (AFM) and contact angle measurements. The effects of the surface modification on the carbon dioxide (CO2) gas permeation of the fluorinated films were evaluated. The results showed effective fluorination of all samples, with C-F, C-F-2 and even C-F-3 groups attached to the polycarbonate, depending on the treatment conditions. The presence of incorporated fluorine molecules absorbed into the polymer structure during treatment was also shown. The polymer films showed an increase of their surface roughness and a decrease in their surface tension due to the plasma treatment. Plasma fluorination also decreases polycarbonate CO2 permeability considerably. The films treated with the lower concentration of SF6 showed the highest barrier values; however, significant differences between the permeability values for the samples treated for different times were not observed.
Subject: plasma treatment
surface characterization
gas permeation
Country: EUA
Editor: Taylor & Francis Inc
Citation: Journal Of Macromolecular Science Part B-physics. Taylor & Francis Inc, v. 46, n. 6, n. 1165, n. 1177, 2007.
Rights: fechado
Identifier DOI: 10.1080/00222340701582928
Date Issue: 2007
Appears in Collections:Unicamp - Artigos e Outros Documentos

Files in This Item:
File Description SizeFormat 
WOS000251134100009.pdf360.44 kBAdobe PDFView/Open

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.