Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/61835
Type: Artigo de periódico
Title: Diffraction-attenuation resistant beams: their higher-order versions and finite-aperture generations
Author: Zamboni-Rached, M
Ambrosio, LA
Hernandez-Figueroa, HE
Abstract: Recently, a method for obtaining diffraction-attenuation resistant beams in absorbing media has been developed in terms of suitable superposition of ideal zero-order Bessel beams. In this work, we show that such beams keep their resistance to diffraction and absorption even when generated by finite apertures. Moreover, we shall extend the original method to allow a higher control over the transverse intensity profile of the beams. Although the method is developed for scalar fields, it can be applied to paraxial vector wave fields, as well. These new beams have many potential applications, such as in free-space optics, medical apparatus, remote sensing, and optical tweezers. (C) 2010 Optical Society of America
Country: EUA
Editor: Optical Soc Amer
Rights: aberto
Date Issue: 2010
Appears in Collections:Unicamp - Artigos e Outros Documentos

Files in This Item:
File Description SizeFormat 
WOS000283247800021.pdf628.61 kBAdobe PDFView/Open


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.