Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/61504
Type: Artigo de periódico
Title: DEVELOPED PROFILE OF HOLOGRAPHICALLY EXPOSED PHOTORESIST GRATINGS
Author: MELLO, BD
DACOSTA, IF
LIMA, CRA
CESCATO, L
Abstract: A simulation of the profile of holographically recorded structures in photoresists is performed. In addition to its simplicity this simulation can he used to take into account the effects that arise from exposure, photosensitization, development, and resolution of positive photoresists. We analyzed the effects of isotropy of wet development, nonlinearity of the photoresist response curve, background light, and standing waves produced by reflection at the film-substrate interface by using this simulation, and the results agree with the experimentally recorded profiles.
Subject: HOLOGRAPHIC GRATINGS
PHOTORESIST PROCESSING
Country: EUA
Editor: Optical Soc Amer
Rights: aberto
Date Issue: 1995
Appears in Collections:Unicamp - Artigos e Outros Documentos

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