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Type: Artigo de periódico
Author: WANG, W
Abstract: The pattern structure and the scaling behavior of the surface width for two deposition models of two kinds of particles, particle A with a probability 1 - P and particle C with a probability P, depositing on a (1 + 1)-dimensional substrate are studied. For model I, a randomlike deposition model, the pattern has a compact structure, and the surface width growth only depends on the time, W is similar to t1/2 for the early stage and W is similar to t(beta(P)) for the intermediate time where beta is a function of P, as well as W is similar to P(-gamma) for the later time. For model II, a ballisticlike deposition model, the pattern and scaling behavior are similar to the ballistic deposition. The scaling of the surface width is W is similar to t(beta(P)) for the early stage of growth and W is similar to L(alpha) for the later stage. The exponent beta is a function of P, while alpha is independent of P.
Country: EUA
Editor: American Physical Soc
Rights: aberto
Identifier DOI: 10.1103/PhysRevE.47.3357
Date Issue: 1993
Appears in Collections:Unicamp - Artigos e Outros Documentos

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