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|Type:||Artigo de periódico|
|Title:||Photooxidation studies on branched polysilanes|
|Abstract:||The photooxidation of films of the branched [(SiEt)(m)(SiPh(2))(n)], (SiPh)(n), [(SiPh)(m)(SiMe(2))], [(Sic-hex)(m)(SiPh(2))(n)], and of the linear (SiPhMe)(n) polymers, by UV irradiation (lambda = 337 nm) was studied by IR and UV-vis spectroscopic measurements. The main chemical changes were the formation of siloxane and silanol groups, with a ratio that varied from 1.4 to 3.0, indicating partial degradation of the branched structures. At the saturation dose, the degree of oxidation of the polymer films was approximately the same (35-41%), but the total amount of oxygen incorporation was greater for the more branched ones, due to the higher density of Si-Si bonds in those polymer films. Copyright (C) 1996 Elsevier Science Ltd|
|Editor:||Pergamon-elsevier Science Ltd|
|Appears in Collections:||Unicamp - Artigos e Outros Documentos|
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