Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/59647
Type: Artigo de periódico
Title: Photoluminescence and the Raman scattering in porous GaSb produced by ion implantation
Author: Danilov, YA
Biryukov, AA
Goncalves, JL
Swart, JW
Iikawa, F
Teschke, O
Abstract: Atomic-force microscopy, photoluminescence, and Raman scattering are used to study the formation of the porous layer in ion-implanted GaSb. As the ion dose increases, first a system of hillocks is formed at the GaSb surface and then a porous layer is produced. The height of the step at the boundary between the porous layer and the unirradiated region can be as large as 1 mum. A broad band is observed in the photoluminescence spectrum in the range from 1.1 to 1.65 eV for ion-implanted GaSb; the intensity of this band increases with the ion dose. Additional lines peaked at 111 and 145 cm(-1) are observed in the Raman spectra of porous GaSb. These lines are characteristic of an oxidized semiconductor. The data obtained indicate that the porous layer that formed as a result of ion implantation into GaSb exhibits properties that are characteristic of nanocrystalline systems. (C) 2005 Pleiades Publishing, Inc.
Country: EUA
Editor: Amer Inst Physics
Rights: fechado
Identifier DOI: 10.1134/1.1852662
Date Issue: 2005
Appears in Collections:Unicamp - Artigos e Outros Documentos

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