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Type: Artigo de periódico
Title: Thermal expansion coefficient, mechanical and structural properties of hydrogenated carbon nitrides
Author: Champi, A
Marques, FC
Abstract: Amorphous hydrogenated carbon nitride films (a-C:H:N) deposited by plasma enhanced chemical vapor deposition of methane (CH4) and nitrogen (N-2), under low (-200 V) and high (-800 V) bias voltage are investigated. The nitrogen content was obtained from X-ray photoelectron spectroscopy and nuclear reaction analysis. Raman measurements were performed at 514 nm (visible) and 244 nm (UV) wavelengths. Mechanical properties (Young's modulus and hardness) and thermal expansion coefficient (TEC) were studied using the bending beam method. Raman spectroscopy shows that the incorporation of nitrogen in a-C:H reduces the disorder in the film, independent of the initial structure of the a-C:H films (tetrahedral-, diamond-, or graphitic-like). The TEC is related to the Raman parameters associated with the degree of sp(2) ordering (aromatic rings) in the film structure, increasing with the nitrogen incorporation. (C) 2012 Elsevier B.V. All rights reserved.
Country: Suíça
Editor: Elsevier Science Sa
Rights: fechado
Identifier DOI: 10.1016/j.diamond.2012.02.021
Date Issue: 2012
Appears in Collections:Unicamp - Artigos e Outros Documentos

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