Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/57530
Type: Artigo de periódico
Title: CVD Diamond growth in the silicon substrates of large area
Author: Moro, JR
Trava-Airoldi, VJ
Corat, EJ
Neto, JE
Amorim, A
Alves, AR
Abstract: Diamond films were grown through Chemical Vapor Deposition (CVD) in silicon substrates (100) of large area (80 cm(2),), in a hot filament chemical vapor deposition (HFCVD), with growth rates over 1,5 mu m/h. The growth of samples was made with different gaseous fluxes and different methane percentages (CH(4)) in hydrogen (H(2)). The samples were analyzed through optical microscopy, Scanning Electron Microscopy and Raman spectroscopy scattering. Such analyzes showed the presence of a high purity diamond in all samples.
Subject: CVD diamond
growth
large area
Country: Brasil
Editor: Escola De Minas
Rights: aberto
Date Issue: 2010
Appears in Collections:Unicamp - Artigos e Outros Documentos

Files in This Item:
File Description SizeFormat 
WOS000278857800011.pdf487.04 kBAdobe PDFView/Open


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.