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Type: Artigo de periódico
Title: CVD Diamond growth in the silicon substrates of large area
Author: Moro, JR
Trava-Airoldi, VJ
Corat, EJ
Neto, JE
Amorim, A
Alves, AR
Abstract: Diamond films were grown through Chemical Vapor Deposition (CVD) in silicon substrates (100) of large area (80 cm(2),), in a hot filament chemical vapor deposition (HFCVD), with growth rates over 1,5 mu m/h. The growth of samples was made with different gaseous fluxes and different methane percentages (CH(4)) in hydrogen (H(2)). The samples were analyzed through optical microscopy, Scanning Electron Microscopy and Raman spectroscopy scattering. Such analyzes showed the presence of a high purity diamond in all samples.
Subject: CVD diamond
large area
Country: Brasil
Editor: Escola De Minas
Rights: aberto
Date Issue: 2010
Appears in Collections:Unicamp - Artigos e Outros Documentos

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