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Type: Artigo de periódico
Title: Copper-vanadium mixed oxide thin film electrodes
Author: Souza, EA
dos Santos, AO
Cardoso, LP
Tabacniks, MH
Landers, R
Gorenstein, A
Abstract: In this work, small amounts of vanadium atoms were incorporated in copper oxide films in order to decrease the charge capacity loss during the electrochemical lithium reaction, mainly in the first cycle. Reactive sputtering was the film deposition technique used to deposit pure copper oxide films, CuO, and copper--vanadium mixed oxides CuO(VOy). The composition, oxidation state and crystallinity of the deposited films were investigated. Electrochemical studies were performed, and the results demonstrated that the mixed oxides have a better electrochemical behavior with a higher capacity and stability in the charge/discharge processes, when compared to the pure CuO films behavior. (C) 2006 Elsevier B.V. All rights reserved.
Subject: copper oxide
reactive sputtering
thin films
Country: Holanda
Editor: Elsevier Science Bv
Rights: fechado
Identifier DOI: 10.1016/j.jpowsour.2006.07.011
Date Issue: 2006
Appears in Collections:Unicamp - Artigos e Outros Documentos

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