Please use this identifier to cite or link to this item:
|Type:||Artigo de periódico|
|Title:||Copper-vanadium mixed oxide thin film electrodes|
dos Santos, AO
|Abstract:||In this work, small amounts of vanadium atoms were incorporated in copper oxide films in order to decrease the charge capacity loss during the electrochemical lithium reaction, mainly in the first cycle. Reactive sputtering was the film deposition technique used to deposit pure copper oxide films, CuO, and copper--vanadium mixed oxides CuO(VOy). The composition, oxidation state and crystallinity of the deposited films were investigated. Electrochemical studies were performed, and the results demonstrated that the mixed oxides have a better electrochemical behavior with a higher capacity and stability in the charge/discharge processes, when compared to the pure CuO films behavior. (C) 2006 Elsevier B.V. All rights reserved.|
|Editor:||Elsevier Science Bv|
|Appears in Collections:||Unicamp - Artigos e Outros Documentos|
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.