Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/56965
Type: Artigo de periódico
Title: CONTINUOUS OPTICAL MEASUREMENT OF THE DRY ETCHING OF SILICON USING THE DIFFRACTION OF A LAMELLAR GRATING
Author: MENDES, GF
CESCATO, L
FREJLICH, J
BRAGA, ES
MAMMANA, AP
Editor: Electrochemical Soc Inc
Rights: aberto
Identifier DOI: 10.1149/1.2113759
Date Issue: 1985
Appears in Collections:Artigos e Materiais de Revistas Científicas - Unicamp

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